Optical Filter Sputter
OFS｜A Precision Sputtering Solution Built for High-End Optical Filters
Optical Filter Sputter｜Super Lattice Multi-layer Sputtering for Precision FiltersA Multilayer Sputtering Platform Built for High-Precision Optical Filters
Optical filters are irreplaceable core components of modern optoelectronic systems — from narrow bandpass filters in 3D sensing modules, fluorescence separation filters in bio-medical fluorescence microscopy, to specialty spectral filters in aerospace applications. Every application depends on extremely precise multilayer optical design. As technical applications grow more demanding, modern high-end filters routinely exceed 100 layers, posing extreme challenges for long-run process stability, thickness precision, and spectral repeatability.
The Dah Young Vacuum OFS (Optical Filter Sputter) is built on Dah Young's proprietary ARMS high-precision sputtering platform, optimized specifically for high-end optical filter mass production. The OFS integrates a separated activated reactive sputtering architecture, multilayer capability, ICP inductively coupled plasma source, and multi-target flexible configuration design — delivering industry-leading filter production solutions for high-end applications including 3D sensing, bio-medical spectroscopy, and aerospace.
Super Lattice Multilayer Capability ｜Precision Stacking of 100+ Layers Without Compromise
High-end filters such as Narrow Bandpass, Edge Filters, and Dual Band filters routinely require precise stacking of 100+ pairs of high/low refractive index layers. Thickness errors in any single layer are amplified through the stack, directly affecting the final filter's center wavelength, full-width-at-half-maximum (FWHM), and pass-band flatness.
The OFS combines the high-deposition-rate advantage of separated activated reactive sputtering with the high-speed rotating chamber design — achieving rapid alternating stacking of metal and oxide layers and completing 100+ layer multilayer structures. Compared with conventional evaporation, the sputtering process delivers more precise thickness control, denser film quality, and more stable long-term environmental performance — single-layer thickness precision reaches ±0.5 nm, with center wavelength deviation controlled at high precision, meeting the highest grade for 3D sensing and bio-medical applications.
ICP High-Density Plasma ｜Low-Particle, High-Uniformity, Long-Term Stability
The filter industry's two greatest concerns are batch-to-batch inconsistency and particle contamination. The OFS comes standard-equipped with Dah Young's in-house ICP inductively coupled plasma source, delivering industry-leading gas dissociation and reaction efficiency — ensuring high consistency in refractive index and spectral performance of every layer. The separated activated reactive architecture effectively suppresses conventional reactive sputtering's target poisoning problem, addressing deposition rate degradation and film quality deterioration commonly seen in long-term production at the root.
The OFS's low-particle process design, combined with precision chamber flow control and optimized gas distribution systems, substantially reduces particle contamination on filter surfaces. For applications such as 3D sensing modules — where a single filter affects entire sensor yield — the OFS delivers industry-leading cleanliness and yield performance.
Flexible Target Configuration ｜Covering Industry-Wide Filter Applications
The OFS employs Dah Young's proprietary multi-target design, with flexible chamber configuration of single or dual targets and pre-mixing of process gases to enhance dissociation activation rate — further breaking through traditional limits of reactive sputtering. Customers can flexibly adjust target configuration and gas formulations based on different filter film system designs — achieving optimal three-way balance among high deposition rate, high film quality, and high stability.
The OFS is planned to launch in the second half of 2026. Potential customers are welcome to make early inquiries on specification details, request sampling validation, or participate in pilot production cooperation. For 3D sensing module manufacturers, bio-medical spectroscopy equipment manufacturers, and satellite component suppliers, the OFS represents an important milestone product as Dah Young enters sputtering-grade high-end filters — providing the industry's only mass-production-grade equipment solution combining sputtering film density with super-multilayer precision.
Specifications
| Model | OFS-1650 |
|---|---|
| Product Line | Sputter Series — Optical Filter Sputter |
| Chamber Specification | Ø1650 mm process chamber / 1650 platform |
| Substrate Material | Glass optical substrates (B270, Schott series, Fused Silica, sapphire) |
| Coating Technology |
Activated Reactive Magnetron Sputtering (ARMS-based) Metal and reaction zones separated to overcome target poisoning |
| Sputter System | Multi-target design | Flexibly configurable single / dual targets adapted to various film systems |
| Plasma Source | 1–2 sets Dah Young in-house ICP (Inductively Coupled Plasma) source (optional) |
| Layer Stacking | 100+ layer multilayer structures |
| Thickness Precision | ± 0.5 nm (single layer) | High center wavelength precision (multilayer) |
| Uniformity | Within ± 0.5% (full load) |
| Materials | Oxides (SiO₂, Ta₂O₅, Nb₂O₅, TiO₂, HfO₂), Metals (Al, Ag, Cr), Nitrides (Si₃N₄), low-absorption high/low refractive-index pairs |
| Ultimate Vacuum | LL Chamber ≦ 8 × 10⁻³ Torr | PR Chamber ≦ 5 × 10⁻⁶ Torr |
| Operation Mode | IPC fully automatic / manual mode | Designed for long-run continuous processing |
| Optional Modules | Dual target configuration / advanced plasma source / custom fixtures |
※ The above are standard configurations; actual specifications can be customized based on customer application needs. OFS is planned for launch in the second half of 2026 (early inquiries for specifications and sampling are welcomed).
01Super Lattice Multilayer Capability
- 100+ Layer Stacking: Capable of completing 100+ layer multilayer structures, meeting the most complex filter film system designs.
- High Deposition Rate, Long Operation: High-speed rotating chamber and separated architecture ensure deposition-rate stability over long process runs.
- Unlimited Layer Count: Theoretically unlimited by layer count — suitable for all complex filter film systems.
02High-Precision Thickness Control
- Single Layer ±0.5 nm: Single-layer thickness precision controlled within ±0.5 nm, meeting optical communications and bio-medical application requirements.
- High Wavelength Precision: Multilayer center wavelength deviation controlled at high precision.
- Full-Load Uniformity: Thickness uniformity within ±0.5% — ensuring identical spectral performance across all substrates in a batch.
03ICP High-Density Plasma Source
- High Dissociation Efficiency: Dah Young in-house ICP plasma source delivers industry-leading gas dissociation and reaction efficiency.
- Densified Film Quality: High activated reaction ensures dense multilayer structure, precise refractive index, and long-term spectral stability.
- Dual Plasma Option: Optional second ICP plasma source available, further enhancing process capability.
04Flexible Target Configuration Design
- Multi-Target Layout: Chamber supports multi-target configuration, flexibly arranged as single / dual targets per film system needs.
- Gas Pre-Mixing: Supports process gas pre-mixing and activation tuning, further breaking through reactive sputtering limits.
- Custom Flexibility: Customized process recipes available per different customer filter film system designs.
05Low-Particle Process Design
- Low-Particle Architecture: Separated architecture and optimized flow design effectively suppress process particle generation.
- High Cleanliness: Ensures filter surface cleanliness — suitable for high-yield applications such as 3D sensing.
- Stable Operation: Maintains stable particle levels over long-term production, ensuring batch-to-batch yield consistency.
Combining multilayer capability, ICP high-density plasma, and low-particle process design, the OFS delivers industry-leading sputtering solutions for various high-end optical filter applications — broadly deployed across 3D sensing, bio-medical spectroscopy, aerospace, optical communications, and other high-precision applications.
013D Sensing & LiDAR
3D sensing modules (FaceID, ToF, structured light) and automotive LiDAR are among today's most important optical applications in consumer electronics and the autonomous vehicle industry. These applications require high-precision Narrow Bandpass filters (940nm, 1380nm, 1550nm) to isolate specific laser wavelengths and filter out ambient light interference. The OFS's multilayer capability and precision thickness control make it key equipment for 3D sensing mass production.
02Bio-medical & Fluorescence Detection
High-sensitivity bio-medical equipment such as fluorescence microscopy, flow cytometry, real-time PCR detection, and DNA sequencers demand exceptional spectral purity, blocking depth (OD > 6), and signal-to-noise ratio. The OFS's high-precision multilayer process and low-particle cleanliness fully meet medical-diagnostic-grade spectral performance requirements.
03Aerospace & Optical Communication
Aerospace applications including LEO satellite communications, space telescopes, ground observation systems, and satellite sensors demand top-tier specialty spectral designs, extreme environmental tolerance, and long-term stability from filters. The OFS's high-density sputtering film quality and multilayer precision make it among the few systems capable of meeting these extreme application demands.
04Advanced Sensing & Health Monitoring
With the proliferation of smart wearables and consumer-grade health monitoring devices, advanced sensing modules including ambient light sensing (ALS), heart rate / blood oxygen sensing (PPG), and near-infrared spectroscopy require high-precision narrow bandpass and bandpass filters to ensure sensing signal accuracy. The OFS's multilayer capability and low-particle process fully meet consumer electronics sensing modules' core requirements for miniaturization, high consistency, and long-term stability.
05Projection & Scientific Instruments
High-end applications including premium projector optical engines, HDR displays, and scientific spectroscopic instruments demand strict color accuracy, spectral flatness, and long-term stability from filters. The OFS produces a wide range of high-end imaging and scientific filters.
