【What is HiPIMS?】

• HiPIMS Theory

HiPIMS (High Power Impulse Magnetron Sputtering) is an advanced physical vapor deposition technology. HiPIMS generates instantaneous high current through a high-power pulse generator with a low duty cycle (<10%) of tens of microseconds, producing high power density at the kW/cm² level. This high-energy pulse excitation significantly increases the ionization yield during the sputtering process, resulting in highly ionized atoms in the deposition process and the formation of very high coating density on the substrate. This technology effectively improves the physical properties of the coating, such as nanocrystalline structure, high coating density, high hardness, excellent wear resistance, and extremely low surface roughness, further expanding the potential use of HiPIMS in high-end applications.

• HiPIMS Features

• High Coating Density: Effectively forms nanocrystalline or amorphous structures, enhancing the coating’s density and structural uniformity.
  
• Ultra-Low Surface Roughness: Produces smooth and flat surfaces, improving surface performance while reducing friction and wear.
• Excellent Substrate Compatibility: Offers high process flexibility—easily adaptable for various substrates such as plastics and ceramics by fine-tuning process parameters and equipment configuration.
• Diverse Coating Material Options: Capable of depositing complex multi-element coatings (with four or more elements) and supports the integration of special elements like tungsten and tantalum to meet advanced material design requirements.