• Superior Density, Uniformity & Conformality with ALD Technology

Atomic Layer Deposition (ALD) of Dah Young Vacuum offers high precision, low-temperature processing, and exceptional thin-film uniformity. It is widely applied in semiconductors, optical components, biomedical devices, and advanced packaging. By leveraging self-limiting reactions, ALD enables atomic-level thickness control with unparalleled film uniformity and conformal coverage. Even on high-aspect-ratio structures or free-form surfaces, ALD delivers excellent density, uniformity, and complete coverage coatings. Whether for dielectric layers, high-refractive-index optical coatings, or moisture and corrosion protection layers, ALD provides stable and reliable solutions that meet the stringent demands of industrial applications.

• Thermal & PE-ALD with Flexible Process Options

ALD system of Dah Young Vacuum integrates both Thermal ALD and Plasma-Enhanced ALD (PE-ALD) technologies, offering flexible process options tailored to different material requirements and applications. Featuring high-precision mass flow controllers (MFCs), pulse valves, and powerful ICP plasma sources, the system ensures ultra-stable gas delivery and optimal deposition conditions. Its low-temperature deposition characteristic makes it applicable to temperature-sensitive substrates such as polymers, OLEDs, MEMS, Micro-LEDs, and other temperature-sensitive substrates, expanding its application potential. With compatibility for a variety of precursors — including Al₂O₃, HfO₂, TiO₂, SiO₂, etc., it boosts product performance and reliability.

• Integrated Production System & Custom Solutions

ALD system integrates SECS/GEM communication protocols, ensuring seamless connectivity with semiconductor manufacturing execution systems to achieve process control and data recording. A high-precision temperature control system and intelligent fault diagnostics further enhance production stability and yield. We offer modular designs and customized solutions to meet diverse production needs. Whether it is small-scale trial production or large-scale mass production, we can provide the most suitable ALD equipment selection to empower customers to stay ahead in high-precision thin film technology.

• Exceptional Uniformity and Complete Coverage
• High Film Density and Low Surface Roughness
• Low-Temperature Processing for Temperature-Sensitive Materials
• Precise Control of Refractive Index and Film Thickness
• Versatile Applications for Various Industrial Coatings