HiPIMS (High Power Impulse Magnetron Sputtering) will be the mainstream of coating technology, which combines all the advantages of common coating technologies and methods on the market.
HIPIMS is a magnetron sputtering technology with high-power pulsed power supply. By generating an instantaneous pulse current that is dozens of times higher than the traditional DC sputtering mode, it can obtain an electron density that is hundreds to ten thousand times higher than that of DC sputtering. The high-density plasma can be used for coating deposition without porosity, high density and good crystallinity at low substrate temperature. It exhibits excellent performance in film hardness and toughness, and an excellent deposition rate, providing the highest productivity.