• R2R Hollow Cathode Deposition Coater
  • R2R Hollow Cathode Deposition Coater

R2R Hollow Cathode Deposition Coater

Model : DMRC-HCD

The specially designed HiPIMS (High-Power Impulse Magnetron Sputtering) source or HCD (Hollow Cathode Deposition) produces an extremely high sputtering rate.

DAH YOUNG cooperates with universities, using front-end academic research facilities to bring innovative production techniques and new applications to the development of textile materials with various functional effects such as antibacterial, conductive, deodorizing.


 Coating Substrate

 Yarn (≒150D), woven fabric, PET film

 Coating Technology

 Sputter source

 Coating Materials

 Oxide film: TiO2, ZrO2, Al2O3, SiO2, ZnO, ITO, PZT
 Metal film: Al, Ti, Zr, Cr, Mg, Cu, Ag, Pt, Pd, W
 Nitride film: TiN, ZrN, CrN
 Boride film: TiB2

 Coating Color

 Golden, silver, rose, purple, blue, gray, black, transparent, etc.

 Chamber Material


 Operating system

 Touch screen + PLC


 2.5 tons

 Chamber Size/Diameter

 750(L) x 600(W) x 600(H)

 Process cooling drum


 Woven effective coating height


 Sputter power supply


 Sputter power (kW)


 Ultimate vacuum (Torr)

 5 x 10-4 Torr

 Web Speed Range


 Power Requirement

 3-phase 220V, 50/60Hz, 56kVA

  1. Compact design and configuration, while achieving high quality and fast output requirements.
  2. The small tension winding system uses an AC servo motor to precisely control the tension and winding speed of the yarn.
  3. Patented winding and guiding design to quickly achieve the required film thickness and high output rate.
  4. Equipped with high-power pulse power supply (HiPIMS) system HCD (Hollow Cathode Deposition) to achieve high and durable plating rates.
  5. Touch screen industrial computer: Complete process parameters and historical records are stored, which facilitate users to read and export historical data and analysis.

Yarn/weave functional film deposition: it can be used for antibacterial, conductive, deodorizing, etc.


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