ARMS Coating Machine
In addition to the field of evaporation optics, Dahyoung Vacuum has developed its own Activated Reactive Magnetron Sputtering equipment to introduce the characteristics of the sputtering process into the optical field. The Activated Reactive Magnetron Sputtering equipment can effectively improve the two main shortcomings of the reactive sputtering process caused by target poisoning, by separating the interaction between the sputtering and the reactive gas:
- Low plating rate.
- The target surface discharge destroys the film quality.
The Activated Reactive Magnetron Sputtering method has a target area and a plasma source area. This plasma source area can also be called a coupled plasma area. During the process, an inert gas is introduced into the target area, and a mixed reactive gas is introduced into the plasma area to reduce the influence of the reactive gas on the target during the sputtering process. The process has high stability and the sputtering process is still maintained. The advantages are high film quality with large area and high uniformity coating.
Because the sputtering process has high molecular kinetic energy and better step coverage, it overcomes the limitation of non-planar substrates to a certain extent, so that even substrates with curved surfaces can be used to prepare uniform optical films. This feature is very suitable for use in vehicle lens for the self-driving car industry.
Dahyoung Vacuum introduces this sputtering process into its optical coating equipment. On the one hand, it introduces the advantages of sputtering, and effectively improves the shortcomings of reactive sputtering, and further gives the equipment "high plating rate", "high film quality", and "high stability" Performance.
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DMC ARMS |
Applicable substrate |
Polycarbonate、glass |
Shen deposition techniques |
Activated Reactive Magnetron Sputtering |
Sputtering system |
Double rotating cylindrical target |
Reaction system |
ICP (Inductively coupled plasma) |
Coating material |
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Chamber material |
SUS304 |
Operating system |
IPC+PLC automatic and manual control. |
Chamber diameter |
Ø1650 mm |
Chamber height | H900 mm |
Ultimate vacuum ( Torr ) |
Vacuum degree better than 6 x 10 -7 Torr |
Operating vacuum | 1.0 X 10-3 Torr ~ 2.5 X 10-4 Torr |
Pumping rate |
A clean, dry and material-free cavity under normal temperature and pressure ,Pump from the atmosphere to 1 x 10-5 Torr ≦ 40 minutes. |
Film thickness monitoring system |
Optical monitoring |
Heating system |
Maximum 150℃ ( reach within 30 minutes) |
Slewing mechanism |
Drum φ1500 mm,10~150 rpm |
Operation interface |
24 inch industrial computer |
Electricity demand |
380 V,50/60 Hz,135 kVA;Single-phase 110 V,50/60 Hz,1 kVA |
Cooling water demand |
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Compressed gas demand |
6~8 kg/cm² |
Process gas demand |
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- Fully automated control (IPC & PLC), composite multilayer film coating system.
- The process is stable and the coating repeatability is high.
- Automatic coating software, easy to set, directly load optical design files and simulate to complete the spectrum.
- Complete process parameters and historical records are convenient for users to read historical data and analyze.
- Bilingual interface, image mode, easy to operate.
- Multiple groups of emergency stop switches are set up to enhance the safety of personnel operations.
- With material preloading and conveying chamber, continuous large-scale uninterrupted production can be realized.
Anti-reflection coatings, Edge filters, Minus filters, Beam splitter filters, Decorative film, Reflector, etc.