• ARMS Coating Machine
  • ARMS Coating Machine
  • ARMS Coating Machine

ARMS Coating Machine

Model : DMC ARMS

In addition to the field of evaporation optics, Dahyoung Vacuum has developed its own Activated Reactive Magnetron Sputtering equipment to introduce the characteristics of the sputtering process into the optical field. The Activated Reactive Magnetron Sputtering equipment can effectively improve the two main shortcomings of the reactive sputtering process caused by target poisoning, by separating the interaction between the sputtering and the reactive gas:

  • Low plating rate.
  • The target surface discharge destroys the film quality.

The Activated Reactive Magnetron Sputtering method has a target area and a plasma source area. This plasma source area can also be called a coupled plasma area. During the process, an inert gas is introduced into the target area, and a mixed reactive gas is introduced into the plasma area to reduce the influence of the reactive gas on the target during the sputtering process. The process has high stability and the sputtering process is still maintained. The advantages are high film quality with large area and high uniformity coating.

Because the sputtering process has high molecular kinetic energy and better step coverage, it overcomes the limitation of non-planar substrates to a certain extent, so that even substrates with curved surfaces can be used to prepare uniform optical films. This feature is very suitable for use in vehicle lens for the self-driving car industry.

Dahyoung Vacuum introduces this sputtering process into its optical coating equipment. On the one hand, it introduces the advantages of sputtering, and effectively improves the shortcomings of reactive sputtering, and further gives the equipment "high plating rate", "high film quality", and "high stability" Performance.

Applicable substrate
Shen deposition techniques Activated Reactive Magnetron Sputtering
Sputtering system
Double rotating cylindrical target
Reaction system
ICP (Inductively coupled plasma)
Coating material
    •  Oxide:SiO2, TiO2, Nb2O5, Al2O3, Ta2O5, ITO
    •  Metal film:Al, Ti, Cr, Cu, Ag, Pt, Pd
    •  Nitride:Si3N4, AlN, TiN
    •  Others:SiOxNy, AlOxNy, SiH
Chamber material SUS304
Operating system IPC+PLC automatic and manual control. 
Chamber diameter
Ø1650 mm
Chamber height H900 mm
Ultimate vacuum ( Torr ) Vacuum degree better than 6 x 10 -7 Torr  
Operating vacuum 1.0 X 10-3 Torr ~ 2.5 X 10-4 Torr   
Pumping rate A clean, dry and material-free cavity under normal temperature and pressure ,Pump from the atmosphere to 1 x 10-5 Torr ≦ 40 minutes.
Film thickness monitoring system
Optical monitoring
Heating system
Maximum 150℃ ( reach within 30 minutes)
Slewing mechanism
Drum φ1500 mm,10~150 rpm
Operation interface
24 inch industrial computer
Electricity demand
380 V,50/60 Hz,135 kVA;Single-phase 110 V,50/60 Hz,1 kVA
Cooling water demand
    • Flow rate >200 L/min
    • Temperature 20~25℃ (no condensation) 
    • Water inlet pressure 5~6 kg/cm²
    • Backwater pressure≦0.5 kg/cm²
    • pH 7.5~8.5
    • Conductivity <600μS/cm
    • Particle size <100μS
Compressed gas demand
6~8 kg/cm²
Process gas demand
    • Ar:purity 99.999%
    • O2:purity 99.999%
    • N2:purity 99.999%

  • Fully automated control (IPC & PLC), composite multilayer film coating system.
  • The process is stable and the coating repeatability is high.
  • Automatic coating software, easy to set, directly load optical design files and simulate to complete the spectrum.
  • Complete process parameters and historical records are convenient for users to read historical data and analyze.
  • Bilingual interface, image mode, easy to operate.
  • Multiple groups of emergency stop switches are set up to enhance the safety of personnel operations.
  • With material preloading and conveying chamber, continuous large-scale uninterrupted production can be realized.

Anti-reflection coatings, Edge filters, Minus filters, Beam splitter filters, Decorative film, Reflector, etc.


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